周艳文，女，1966年4月出生，1988年毕业于东北大学，金属物理专业，学士；1988年-2000年，鞍钢从事金属材料研究工作，先后聘任为工程师、高级工程师及东大在企业硕士生导师；2000年-2005年，英国University of Salford, 表面工程专业，博士学位；2005年至今，半岛.体育（中国）官方网站，材冶学院，教授。

主要研究方向

1．磁控溅射等离子体与薄膜生长关系；

2．磁控溅射制备光电薄膜。

学术论文

1. 赵卓，周艳文，刘悦，真空科学与技术，“非平衡磁控溅射二维磁场分布模似计算”Vol. 30 No. 3, Nay-Jun 2010, 265

2. Yanwen Zhou,Zhou Zhao, Yue Liu and Peter Kelly, “Numerical simulation of magnetron fields under unbalanced and closed-field unbalanced magnetron and the effect on the feature of plasma”, Frontier of Applied Plasma Technology, Volume2, July 2009, 15-19.

3. Yanwen Zhou,Zhuo Zhao, Yie Liu, “Numerical Simulation of Magnetron Fields in Unbalanced and Closed-Field Unbalanced Magnetron”, Plasma Application & Hybrid Functional Materials, Vol.18, March 2009, 17-18.

4. Yanwen Zhou,Zhuo Zhao, “Properties of Multi-Component CrBMoS Coatings by Pulsed Magnetron Sputtering from Powder Targets”, Materials Science & Technology 2009 Conference & Exhibition, October 25-29, 2009, Pittsburgh, US.

5. Y. Zhou, PJ Kelly, QP Sun, ‘The Characteristics of the Plasma in the Powder Rig‘,516 (2008) 332-337.

6. PJ Kelly, A A Onifade, Y Zhou, ect., ‘The Influence of Pulse Frequency and Duty on the Deposition Rate in Pulsed Magnetron Sputtering’ 2007, 4, 246-252.

7. PJ Kelly, Y Zhou‘Zinc Oxide-Based Transparent Conductive Oxide Films Prepared by Pulsed Magnetron Sputtering From Powder Targets: Process Features and Film Properties’，J. Vac. Sci. Technol. A 24(5) Sep/Oct. 2006 1782-1789.

8. PJ Kelly, Y Zhou, etc., ‘Pulsed Magnetron Sputtering of Powder Targets: a New Development tool for multi-component Costings’, 48 SVC Annual Technical Conference Porceedings, (2005) ISSN 0737-5921.